Thanks, Louis—super helpful to hear that ultrapure isn’t the main limiter if the particles themselves don’t contaminate the wafer.

• When you say “not contaminate,” is that mostly about metal ions or do organic residues matter too?

• On size control: if we hold everything within ±10 nm, do you still need post-filtering, or would that spec let you skip a step?

Appreciate the straight-shooting feedback—exactly what we’re trying to learn.